DEPOSITION OF POLY(METHYL METHACRYLATE) FILMS BY UV LASER-ABLATION

被引：46
作者：
BLANCHET, GB
机构：
[1] E. I. du Pont de Nemours and Company, Central Sciences and Engineering, Delaware 19898, E356/139, Wilmington
来源：
MACROMOLECULES | 1995年 / 28卷 / 13期
关键词：
D O I：
10.1021/ma00117a034
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
Thin films of poly(methyl methacrylate) (PMMA) were deposited by laser ablation using the fourth harmonic, at 266 nm, of a Nd-YAG laser. The temperature of the glass substrate during deposition was found to be critical in determining the morphology and molecular weight of the ablated films. When the temperature of the glass substrate was maintained below the glass transition, hazy films of low density and molecular weight were obtained. In contrast, above T-g the ablated material coalesced into a clear, denser film of high molecular weight and excellent adhesion to the glass. We suggest that pyrolytic decomposition and subsequent repolymerization are a plausible mechanism to the formation of PMMA films by laser ablation.
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收藏
页码：4603 / 4607
页数：5
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