ANORGANIC POSITIVRESIST BASED ON AMORPHOUS GESE2 LAYERS FOR LITHOGRAPHIC PURPOSE

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作者：
THOMAS, A
KLUGE, G
KLABES, R
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来源：
JOURNAL OF INFORMATION RECORDING MATERIALS | 1990年 / 18卷 / 01期
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T [工业技术];
学科分类号：
08 ;
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页码：35 / 43
页数：9
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