SI DEPOSITION BY ELECTRON-BEAM INDUCED SURFACE-REACTION

被引：13
作者：
MATSUI, S
MITO, M
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 16期
关键词：
D O I：
10.1063/1.100465
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1492 / 1494
页数：3
相关论文
共 50 条
[31]   DYNAMICS OF A SURFACE-REACTION INDUCED BY PULSED LASER [J].
KAWAI, T ;
TANIMURA, K ;
SAKATA, T .
ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1979, (APR) :86-86
[32]   Energy deposition and transfer in electron-beam lithography [J].
Wu, B ;
Neureuther, AR .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06) :2508-2511
[33]   Surface-reaction induced structural oscillations in the subsurface [J].
Xianhu Sun ;
Wenhui Zhu ;
Dongxiang Wu ;
Chaoran Li ;
Jianyu Wang ;
Yaguang Zhu ;
Xiaobo Chen ;
Jorge Anibal Boscoboinik ;
Renu Sharma ;
Guangwen Zhou .
Nature Communications, 11
[34]   ELECTRON-BEAM VAPOR-DEPOSITION LINES [J].
MARKOV, H .
JOURNAL OF METALS, 1987, 39 (06) :57-57
[35]   DEPOSITION OF ALUMINUM FROM AN ELECTRON-BEAM SOURCE [J].
GRAPER, EB .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1972, 9 (01) :33-&
[36]   ELECTRON-BEAM AND LASER SURFACE ALLOYING OF AL-SI BASE ALLOYS [J].
VANHILLE, P ;
TOSTO, S ;
PELLETIER, JM ;
ISSA, A ;
VANNES, AB ;
CRIQUI, B .
SURFACE & COATINGS TECHNOLOGY, 1992, 50 (03) :295-303
[37]   OXIDATION OF A SI(100) SURFACE BY THE ELECTRON-BEAM OF THE AUGER SPECTROMETER IN THE PRESENCE OF WATER [J].
VISCIDO, L ;
HERAS, JM .
JOURNAL OF PHYSICS-CONDENSED MATTER, 1993, 5 :A159-A160
[38]   XPS INVESTIGATION OF ELECTRON-BEAM EFFECTS ON A TRIMETHYLSILANE DOSED SI(100) SURFACE [J].
WANG, PW ;
BATER, S ;
ZHANG, LP ;
ASCHERL, M ;
CRAIG, JH .
APPLIED SURFACE SCIENCE, 1995, 90 (04) :413-417
[39]   MECHANISM OF SURFACE-REACTION IN THE DEPOSITION PROCESS OF ALPHA-SI-H BY RF GLOW-DISCHARGE [J].
MAEDA, K ;
KUROE, A ;
UMEZU, I .
PHYSICAL REVIEW B, 1995, 51 (16) :10635-10645
[40]   AUGER-ELECTRON SPECTROSCOPY ELECTRON-BEAM INDUCED DAMAGE OF A H2O-COVERED SI(100) SURFACE [J].
VISCIDO, L ;
HERAS, JM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1993, 11 (01) :175-179
12345