SI DEPOSITION BY ELECTRON-BEAM INDUCED SURFACE-REACTION

被引：13
|
作者：
MATSUI, S
MITO, M
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 16期
关键词：
D O I：
10.1063/1.100465
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1492 / 1494
页数：3
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