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ANALYSIS OF GAMMA-RADIATION INDUCED INSTABILITY MECHANISMS IN CMOS TRANSISTORS
被引:40
作者
:
DIMITRIJEV, S
论文数:
0
引用数:
0
h-index:
0
DIMITRIJEV, S
GOLUBOVIC, S
论文数:
0
引用数:
0
h-index:
0
GOLUBOVIC, S
ZUPAC, D
论文数:
0
引用数:
0
h-index:
0
ZUPAC, D
PEJOVIC, M
论文数:
0
引用数:
0
h-index:
0
PEJOVIC, M
STOJADINOVIC, N
论文数:
0
引用数:
0
h-index:
0
STOJADINOVIC, N
机构
:
来源
:
SOLID-STATE ELECTRONICS
|
1989年
/ 32卷
/ 05期
关键词
:
D O I
:
10.1016/0038-1101(89)90122-6
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:349 / 353
页数:5
相关论文
共 27 条
[21]
ROLE OF HYDROGEN IN SIO2-FILMS ON SILICON
[J].
REVESZ, AG
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0
引用数:
0
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机构:
COMSAT Laboratories, Clarksburg
REVESZ, AG
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(01)
:122
-130
[22]
SARABAYROUSE G, COMMUNICATION
[23]
THE ROLE OF HYDROGEN IN RADIATION-INDUCED DEFECT FORMATION IN POLYSILICON GATE MOS DEVICES
[J].
SCHWANK, JR
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0
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SCHWANK, JR
;
FLEETWOOD, DM
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FLEETWOOD, DM
;
WINOKUR, PS
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WINOKUR, PS
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DRESSENDORFER, PV
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DRESSENDORFER, PV
;
TURPIN, DC
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TURPIN, DC
;
SANDERS, DT
论文数:
0
引用数:
0
h-index:
0
SANDERS, DT
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1987,
34
(06)
:1152
-1158
[24]
IMAGE FORCES AND BEHAVIOR OF MOBILE POSITIVE-IONS IN SILICON DIOXIDE
[J].
WILLIAMS, R
论文数:
0
引用数:
0
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机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
WILLIAMS, R
;
WOODS, MH
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RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
WOODS, MH
.
APPLIED PHYSICS LETTERS,
1973,
22
(09)
:458
-459
[25]
2-STAGE PROCESS FOR BUILDUP OF RADIATION-INDUCED INTERFACE STATES
[J].
WINOKUR, PS
论文数:
0
引用数:
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机构:
Harry Diamond Laboratories, U.S. Army Electronics Research and Development Command, Adelphi
WINOKUR, PS
;
BOESCH, HE
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Harry Diamond Laboratories, U.S. Army Electronics Research and Development Command, Adelphi
BOESCH, HE
;
MCGARRITY, JM
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0
机构:
Harry Diamond Laboratories, U.S. Army Electronics Research and Development Command, Adelphi
MCGARRITY, JM
;
MCLEAN, FB
论文数:
0
引用数:
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Harry Diamond Laboratories, U.S. Army Electronics Research and Development Command, Adelphi
MCLEAN, FB
.
JOURNAL OF APPLIED PHYSICS,
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50
(05)
:3492
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[26]
FIELD-DEPENDENT AND TIME-DEPENDENT RADIATION EFFECTS AT SIO2-SI INTERFACE OF HARDENED MOS CAPACITORS
[J].
WINOKUR, PS
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0
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WINOKUR, PS
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BOESCH, HE
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MCGARRITY, JM
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MCLEAN, FB
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MCLEAN, FB
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IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1977,
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(06)
:2113
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[27]
THE NATURE OF THE DEEP HOLE TRAP IN MOS OXIDES
[J].
WITHAM, HS
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0
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WITHAM, HS
;
LENAHAN, PM
论文数:
0
引用数:
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LENAHAN, PM
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1987,
34
(06)
:1147
-1151
←
1
2
3
→
共 27 条
[21]
ROLE OF HYDROGEN IN SIO2-FILMS ON SILICON
[J].
REVESZ, AG
论文数:
0
引用数:
0
h-index:
0
机构:
COMSAT Laboratories, Clarksburg
REVESZ, AG
.
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1979,
126
(01)
:122
-130
[22]
SARABAYROUSE G, COMMUNICATION
[23]
THE ROLE OF HYDROGEN IN RADIATION-INDUCED DEFECT FORMATION IN POLYSILICON GATE MOS DEVICES
[J].
SCHWANK, JR
论文数:
0
引用数:
0
h-index:
0
SCHWANK, JR
;
FLEETWOOD, DM
论文数:
0
引用数:
0
h-index:
0
FLEETWOOD, DM
;
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
;
DRESSENDORFER, PV
论文数:
0
引用数:
0
h-index:
0
DRESSENDORFER, PV
;
TURPIN, DC
论文数:
0
引用数:
0
h-index:
0
TURPIN, DC
;
SANDERS, DT
论文数:
0
引用数:
0
h-index:
0
SANDERS, DT
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1987,
34
(06)
:1152
-1158
[24]
IMAGE FORCES AND BEHAVIOR OF MOBILE POSITIVE-IONS IN SILICON DIOXIDE
[J].
WILLIAMS, R
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
WILLIAMS, R
;
WOODS, MH
论文数:
0
引用数:
0
h-index:
0
机构:
RCA LABS, PRINCETON, NJ 08540 USA
RCA LABS, PRINCETON, NJ 08540 USA
WOODS, MH
.
APPLIED PHYSICS LETTERS,
1973,
22
(09)
:458
-459
[25]
2-STAGE PROCESS FOR BUILDUP OF RADIATION-INDUCED INTERFACE STATES
[J].
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
机构:
Harry Diamond Laboratories, U.S. Army Electronics Research and Development Command, Adelphi
WINOKUR, PS
;
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
机构:
Harry Diamond Laboratories, U.S. Army Electronics Research and Development Command, Adelphi
BOESCH, HE
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
机构:
Harry Diamond Laboratories, U.S. Army Electronics Research and Development Command, Adelphi
MCGARRITY, JM
;
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
机构:
Harry Diamond Laboratories, U.S. Army Electronics Research and Development Command, Adelphi
MCLEAN, FB
.
JOURNAL OF APPLIED PHYSICS,
1979,
50
(05)
:3492
-3494
[26]
FIELD-DEPENDENT AND TIME-DEPENDENT RADIATION EFFECTS AT SIO2-SI INTERFACE OF HARDENED MOS CAPACITORS
[J].
WINOKUR, PS
论文数:
0
引用数:
0
h-index:
0
WINOKUR, PS
;
BOESCH, HE
论文数:
0
引用数:
0
h-index:
0
BOESCH, HE
;
MCGARRITY, JM
论文数:
0
引用数:
0
h-index:
0
MCGARRITY, JM
;
MCLEAN, FB
论文数:
0
引用数:
0
h-index:
0
MCLEAN, FB
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1977,
24
(06)
:2113
-2118
[27]
THE NATURE OF THE DEEP HOLE TRAP IN MOS OXIDES
[J].
WITHAM, HS
论文数:
0
引用数:
0
h-index:
0
WITHAM, HS
;
LENAHAN, PM
论文数:
0
引用数:
0
h-index:
0
LENAHAN, PM
.
IEEE TRANSACTIONS ON NUCLEAR SCIENCE,
1987,
34
(06)
:1147
-1151
←
1
2
3
→