ION-CHANNELING AND OPTICAL-ABSORPTION STUDIES OF IMPLANTATION DISORDER IN GERMANIUM

被引：4
|
作者：
PICRAUX, ST [1 ]
STEIN, HJ [1 ]
机构：
[1] SANDIA LABS,ALBUQUERQUE,NM 87115
来源：
JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 09期
关键词：
D O I：
10.1063/1.1663860
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：3784 / 3788
页数：5
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