ION-CHANNELING AND OPTICAL-ABSORPTION STUDIES OF IMPLANTATION DISORDER IN GERMANIUM

被引：4

作者：

PICRAUX, ST ^{[1
]}

STEIN, HJ ^{[1
]}

机构：

[1] SANDIA LABS,ALBUQUERQUE,NM 87115

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 09期

关键词：

D O I：

10.1063/1.1663860

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3784 / 3788

页数：5

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