RESIDUAL-STRESS ANISOTROPY, STRESS-CONTROL, AND RESISTIVITY IN POST CATHODE MAGNETRON SPUTTER DEPOSITED MOLYBDENUM FILMS

被引：40

作者：

CUTHRELL, RE

MATTOX, DM

PEEPLES, CR

DREIKE, PL

LAMPPA, KP

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 05期

关键词：

D O I：

10.1116/1.575451

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：2914 / 2920

页数：7

共 36 条

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