SCHOTTKY BARRIERS AT THE INTERFACE BETWEEN AMORPHOUS SILICON AND ELECTROLYTES

被引:27
作者
WILLIAMS, R
机构
[1] RCA Laboratories, Princeton
关键词
D O I
10.1063/1.326198
中图分类号
O59 [应用物理学];
学科分类号
摘要
A Schottky barrier forms at the interface between amorphous silicon and an electrolyte. The barrier height, φB, can be estimated from the open-circuit photovoltage. It depends on the potential-determining ion in solution and is a linear function of the redox potential. The magnitude of φB ranged from 1.0 to 1.7 eV for various electrolyte compositions.
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页码:2848 / 2851
页数:4
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