THE MECHANISM OF BLISTER FORMATION AND RUPTURE IN THE PITTING OF ION-IMPLANTED ALUMINUM

被引：35
作者：
NATISHAN, PM
MCCAFFERTY, E
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1989年 / 136卷 / 01期
关键词：
D O I：
10.1149/1.2096613
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
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页码：53 / 58
页数：6
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