THE PROPERTIES AND EXPOSURE CHEMISTRY OF A SOLUBLE POLYDIACETYLENE (P4BCMU) USED AS A NEGATIVE ELECTRON-BEAM RESIST

被引：14

作者：

COLTON, RJ

MARRIAN, CRK

SNOW, A

DILELLA, D

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1987年 / 5卷 / 05期

关键词：

D O I：

10.1116/1.583614

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1353 / 1359

页数：7

共 11 条

[1] RAMAN SPECTRAL SHIFTS RELEVANT TO ELECTRON DELOCALIZATION IN POLYDIACETYLENES [J].

BAUGHMAN, RH ;

WITT, JD ;

YEE, KC .

JOURNAL OF CHEMICAL PHYSICS, 1974, 60 (12) :4755-4759

[2]

Bloor D, 1985, POLYDIACETYLENES SYN

[3]

BRODIE I, 1982, PHYSICS MICROFABRICA

[4]

Leary H. J. Jr., 1979, Surface and Interface Analysis, V1, P75, DOI 10.1002/sia.740010302

[5] MODELING VIBRATIONAL MODES IN DIACETYLENE POLYMERS [J].

LEWIS, WF ;

BATCHELDER, DN .

CHEMICAL PHYSICS LETTERS, 1979, 60 (02) :232-237

[6] STRUCTURE-PROPERTY RELATIONSHIPS OF DIACETYLENES AND THEIR POLYMERS [J].

PATEL, GN ;

MILLER, GG .

JOURNAL OF MACROMOLECULAR SCIENCE-PHYSICS, 1981, B20 (01) :111-131

[7]

PATEL GN, 1978, POLYM PREPRINT AM CH, V19, P160

[8]

SCHOFIELD JH, 1976, J ELECTRON SPECTROSC, V8, P129

[9]

THOMPSON LF, 1984, AM CHEM SOC S SER

[10]

THOMPSON LF, 1983, AM CHEM SOC S SER

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