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CURRENT GAIN RECOVERY IN SILICON-NITRIDE PASSIVATED PLANAR TRANSISTORS BY HYDROGEN IMPLANTATION
被引:10
作者
:
KELLNER, W
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCH LAB,MUNICH D-8000,FED REP GER
KELLNER, W
GOETZBERGER, A
论文数:
0
引用数:
0
h-index:
0
机构:
SIEMENS AG,FORSCH LAB,MUNICH D-8000,FED REP GER
GOETZBERGER, A
机构
:
[1]
SIEMENS AG,FORSCH LAB,MUNICH D-8000,FED REP GER
[2]
INST ANGEW FESTKORPER PHYS,FREIBURG D-7800,FED REP GER
来源
:
IEEE TRANSACTIONS ON ELECTRON DEVICES
|
1975年
/ 22卷
/ 08期
关键词
:
D O I
:
10.1109/T-ED.1975.18174
中图分类号
:
TM [电工技术];
TN [电子技术、通信技术];
学科分类号
:
0808 ;
0809 ;
摘要
:
引用
收藏
页码:531 / 533
页数:3
相关论文
共 6 条
[1]
BALK P, 1965, SPR M EL SOC
[2]
BALK P, 1965, FAL M EL SOC
[3]
LOW-TEMPERATURE REDUCTION OF FAST SURFACE STATES ASSOCIATED WITH THERMALLY OXIDIZED SILICON
CASTRO, PL
论文数:
0
引用数:
0
h-index:
0
CASTRO, PL
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(02)
: 280
-
+
[4]
CHARACTERISTICS OF FAST SURFACE STATES ASSOCIATED WITH SIO2-SI AND SI3N4-SIO2-SI STRUCTURES
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California
DEAL, BE
MACKENNA, EL
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California
MACKENNA, EL
CASTRO, PL
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California
CASTRO, PL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1969,
116
(07)
: 997
-
&
[5]
ON ROLE OF SODIUM AND HYDROGEN IN SI-SIO2 SYSTEM
KOOI, E
论文数:
0
引用数:
0
h-index:
0
KOOI, E
WHELAN, MV
论文数:
0
引用数:
0
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WHELAN, MV
[J].
APPLIED PHYSICS LETTERS,
1966,
9
(08)
: 314
-
+
[6]
IONIC CONTAMINATION-INDUCED DEGRADATION OF LOW CURRENT HFE
MCDONALD, BA
论文数:
0
引用数:
0
h-index:
0
MCDONALD, BA
[J].
SOLID-STATE ELECTRONICS,
1971,
14
(01)
: 17
-
+
←
1
→
共 6 条
[1]
BALK P, 1965, SPR M EL SOC
[2]
BALK P, 1965, FAL M EL SOC
[3]
LOW-TEMPERATURE REDUCTION OF FAST SURFACE STATES ASSOCIATED WITH THERMALLY OXIDIZED SILICON
CASTRO, PL
论文数:
0
引用数:
0
h-index:
0
CASTRO, PL
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
DEAL, BE
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1971,
118
(02)
: 280
-
+
[4]
CHARACTERISTICS OF FAST SURFACE STATES ASSOCIATED WITH SIO2-SI AND SI3N4-SIO2-SI STRUCTURES
DEAL, BE
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California
DEAL, BE
MACKENNA, EL
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California
MACKENNA, EL
CASTRO, PL
论文数:
0
引用数:
0
h-index:
0
机构:
Fairchild Semiconductor Research and Development Laboratory, Palo Alto, California
CASTRO, PL
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1969,
116
(07)
: 997
-
&
[5]
ON ROLE OF SODIUM AND HYDROGEN IN SI-SIO2 SYSTEM
KOOI, E
论文数:
0
引用数:
0
h-index:
0
KOOI, E
WHELAN, MV
论文数:
0
引用数:
0
h-index:
0
WHELAN, MV
[J].
APPLIED PHYSICS LETTERS,
1966,
9
(08)
: 314
-
+
[6]
IONIC CONTAMINATION-INDUCED DEGRADATION OF LOW CURRENT HFE
MCDONALD, BA
论文数:
0
引用数:
0
h-index:
0
MCDONALD, BA
[J].
SOLID-STATE ELECTRONICS,
1971,
14
(01)
: 17
-
+
←
1
→