ELECTRICAL PROPERTIES OF NICKEL-LOW-DOPED N-TYPE GALLIUM-ARSENIDE SCHOTTKY-BARRIER DIODES

被引:131
作者
HACKAM, R
HARROP, P
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D O I
10.1109/T-ED.1972.17586
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:1231 / +
页数:1
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[1]   TRANSPORT PROPERTIES OF METAL-SILICON SCHOTTKY BARRIERS [J].
ARIZUMI, T ;
HIROSE, M .
JAPANESE JOURNAL OF APPLIED PHYSICS, 1969, 8 (06) :749-+
[2]   DOPING DEPENDENCE OF BARRIER HEIGHT OF PALLADIUM-SILICIDE SCHOTTKY-DIODES [J].
BROOM, RF .
SOLID-STATE ELECTRONICS, 1971, 14 (11) :1087-+
[3]   ELECTRON EFFECTIVE MASSES OF INAS AND GAAS AS A FUNCTION OF TEMPERATURE AND DOPING [J].
CARDONA, M .
PHYSICAL REVIEW, 1961, 121 (03) :752-&
[4]   SHOT NOISE IN SILICON SCHOTTKY BARRIER DIODES [J].
COWLEY, AM ;
ZETTLER, RA .
IEEE TRANSACTIONS ON ELECTRON DEVICES, 1968, ED15 (10) :761-&
[5]   TITANIUM-SILICON SCHOTTKY BARRIER DIODES [J].
COWLEY, AM .
SOLID-STATE ELECTRONICS, 1970, 13 (04) :403-+
[6]   GALLIUM PHOSPHIDE-GOLD SURFACE BARRIER [J].
COWLEY, M ;
HEFFNER, H .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (01) :255-&
[7]   EQUALITY OF TEMPERATURE DEPENDENCE OF GOLD-SILICON SURFACE BARRIER + SILICON ENERGY GAP IN AU N-TYPE SI DIODES ( PHOTOEMISSION THRESHOLD ANALYSIS 100-370 DEGREES K E ) [J].
CROWELL, CR ;
SZE, SM ;
SPITZER, WG .
APPLIED PHYSICS LETTERS, 1964, 4 (05) :91-&
[8]   NORMALIZED THERMIONIC-FIELD (T-F) EMISSION IN METAL-SEMICONDUCTOR (SCHOTTKY) BARRIERS [J].
CROWELL, CR ;
RIDEOUT, VL .
SOLID-STATE ELECTRONICS, 1969, 12 (02) :89-&
[9]   RICHARDSON CONSTANT FOR THERMIONIC EMISSION IN SCHOTTKY BARRIER DIODES [J].
CROWELL, CR .
SOLID-STATE ELECTRONICS, 1965, 8 (04) :395-&
[10]   CURRENT TRANSPORT IN METAL-SEMICONDUCTOR BARRIERS [J].
CROWELL, CR ;
SZE, SM .
SOLID-STATE ELECTRONICS, 1966, 9 (11-1) :1035-&