RESISTIVE STABILIZATION OF A DISCHARGE-EXCITED XECL-STAR LASER

被引：7
作者：
HOGAN, DC
KEARSLEY, AJ
WEBB, CE
机构：
来源：
JOURNAL OF PHYSICS D-APPLIED PHYSICS | 1980年 / 13卷 / 12期
关键词：
D O I：
10.1088/0022-3727/13/12/001
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：L225 / L228
页数：4
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