OPTICAL-PROPERTIES OF SPUTTER-DEPOSITED CERIUM OXYFLUORIDE THIN-FILMS

被引：58

作者：

ZHENG, SY

ANDERSSONFALDT, AM

STJERNA, B

GRANQVIST, CG

机构：

[1] CHALMERS UNIV TECHNOL, DEPT PHYS, S-41296 GOTHENBURG, SWEDEN

[2] UNIV UPPSALA, DEPT TECHNOL, S-75105 UPPSALA, SWEDEN

来源：

APPLIED OPTICS | 1993年 / 32卷 / 31期

关键词：

D O I：

10.1364/AO.32.006303

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

CeO(x)F(y) films were made by reactive rf magnetron sputtering of Ce in Ar + O2 + CF4. Stoichiometries between CeO2 and CeO1.0F1.3 were obtained when the CF4 content lay between 0% and 9%. For wavelengths lambda of > 0.4 mum, the films were almost nonabsorbing, and the refractive index at lambda = 0.55 mum went from 2.32 for CeO2 to 1.62 at 9% CF4. At lambda < 0.4 mum and < 4% CF4, the optical properties were consistent with an indirect band gap at 3.1-3.2 eV. CeO2 films could serve as intercalation hosts for Li+ ions.

引用

页码：6303 / 6309

页数：7

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