TEMPERATURE-COEFFICIENT OF RESISTANCE OF THIN MANGANESE FILMS

[1] TEMPERATURE COEFFICIENTS OF RESISTANCE OF METALLIC FILMS IN THE TEMPERATURE RANGE 25-DEGREES-C TO 600-DEGREES-C [J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (03) : 313 - 322

[2] CHANDER R, 1967, INDIAN J PURE AP PHY, V5, P397

[3] Coutts T. J., 1978, ACTIVE PASSIVE THIN, P57

[4] DEGENHART HJ, 1963, 10 T NAT VAC S, P480

[5] HOLLAND L, 1961, VACUUM DEPOSITION TH

[6] TEMPERATURE COEFFICIENT OF RESISTANCE IN THIN VANADIUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (11) : 5343 - &

[7] LARSON D, 1971, PHYS THIN FILMS, V6, P94

[8] Maissel L.I., 1970, HDB THIN FILM TECHNO

[9] NEUGEBAUER C, 1964, PHYS THIN FILMS, V2, P23

[10] SHIVAPRASAD SM, UNPUBLISHED

[1] TEMPERATURE COEFFICIENTS OF RESISTANCE OF METALLIC FILMS IN THE TEMPERATURE RANGE 25-DEGREES-C TO 600-DEGREES-C [J]. JOURNAL OF APPLIED PHYSICS, 1959, 30 (03) : 313 - 322

[2] CHANDER R, 1967, INDIAN J PURE AP PHY, V5, P397

[3] Coutts T. J., 1978, ACTIVE PASSIVE THIN, P57

[4] DEGENHART HJ, 1963, 10 T NAT VAC S, P480

[5] HOLLAND L, 1961, VACUUM DEPOSITION TH

[6] TEMPERATURE COEFFICIENT OF RESISTANCE IN THIN VANADIUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (11) : 5343 - &

[7] LARSON D, 1971, PHYS THIN FILMS, V6, P94

[8] Maissel L.I., 1970, HDB THIN FILM TECHNO

[9] NEUGEBAUER C, 1964, PHYS THIN FILMS, V2, P23

[10] SHIVAPRASAD SM, UNPUBLISHED