RF SPUTTERED TANTALUM FILMS DEPOSITED IN AN OXYGEN DOPED ATMOSPHERE

被引：10
作者：
BAKER, PN
机构：
来源：
THIN SOLID FILMS | 1970年 / 6卷 / 05期
关键词：
D O I：
10.1016/0040-6090(70)90090-8
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
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页码：R57 / &
相关论文
共 5 条
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[4]   EFFECT OF BACKGROUND-GAS IMPURITIES ON FORMATION OF SPUTTERED BETA-TANTALUM FILMS [J].
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[5]   PHASE COMPOSITION AND CONDUCTIVITY OF SPUTTERED TANTALUM [J].
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THIN SOLID FILMS, 1970, 5 (5-6) :407-+
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