SIMPLE ION-SOURCE FOR TARGET PREPARATION VIA ION-BEAM SPUTTERING

被引:3
作者
NOLEN, JA [1 ]
CURTIN, MS [1 ]
DYSON, TE [1 ]
机构
[1] MICHIGAN STATE UNIV,DEPT PHYS,E LANSING,MI 48824
来源
NUCLEAR INSTRUMENTS & METHODS | 1978年 / 150卷 / 03期
关键词
D O I
10.1016/0029-554X(78)90131-3
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:581 / 583
页数:3
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