DESIGN OF AN EXTENDED IMAGE FIELD SOFT-X-RAY PROJECTION SYSTEM

被引：5
作者：
VOORMA, HJ
BIJKERK, F
机构：
[1] FOM Institute for Plasma Physics Rijnhuizen, 3430 BE Nieuwegein
来源：
MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期
关键词：
D O I：
10.1016/0167-9317(92)90029-Q
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
A soft-x-ray projection system has been designed, which consists of spherical components to be coated with multilayer reflection coatings. In the design, a two-mirror system and a spherical reflection mask, the optical aberrations were minimized. The design enables a resolution of sub-100 nm over a circular image field with a diameter of 4 mm at a wavelength of 10.5 nm. The assembly tolerances of the system and the fabrication tolerances of the substrates have been calculated. The surface roughness determined from our superpolished quartz substrates amounts to 0.3 nm, which is sufficient to meet the required specifications.
引用
收藏
页码：145 / 148
页数：4
相关论文
共 7 条
  • [1] Shealy, Jiang, Hoover, Proc. Spie, 1343, (1990)
  • [2] Jewell, Rodgers, Thompson, Reflective systems design study for soft x-ray projection lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 8, 6, (1990)
  • [3] Head, Proc. Phys. Soc. LXX, 10 B, pp. 944-949, (1957)
  • [4] Chauvineau, <title>Multilayers For X- In Optics</title>, Proc. Spie, 1140, pp. 440-447, (1989)
  • [5] Hawryluk, Proc. OSA Soft X-ray Projection Lithography, (1991)
  • [6] Zmeck, Harvey, Maron, Proc. Spie, 1160, pp. 216-218, (1989)
  • [7] Takacs, SR mirror metrology: Finish measurements 1984–1988, Synchrotron Radiation News, 2, 6, (1989)
1