OPTICAL-ABSORPTION AS A CONTROL TEST FOR PLASMA SILICON-NITRIDE DEPOSITION

被引:48
作者
RAND, MJ
WONSIDLER, DR
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D O I
10.1149/1.2131407
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
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页码:99 / 101
页数:3
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