OPTICAL LIMITING IN SEMICONDUCTORS

被引:82
作者
RALSTON, JM
CHANG, RK
机构
[1] Dunham Laboratory, Yale University, New Haven
关键词
D O I
10.1063/1.1652951
中图分类号
O59 [应用物理学];
学科分类号
摘要
The nonlinear absorption coefficients of Si from 146 to 452°K and of CdSe, CdTe, and GaAs at 300°K were measured with a Nd:YAlG Q-switched laser. The reported stepwise nature of nonlinear absorption for Si is confirmed, but the assignment of a three-photon process is uncertain. As an optical limiter, the optimum Si thickness to be inserted within a Nd:laser cavity is discussed. © 1969 The American Institute of Physics.
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页码:164 / &
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