共 50 条
[41]
DETERMINATION OF IN-DEPTH THERMAL STRAIN DISTRIBUTION IN MOLECULAR-BEAM EPITAXY GAAS ON SI
[J].
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,
1991, 53 (03)
:260-264
[42]
STRAIN RELAXATION DURING THE INITIAL-STAGES OF GROWTH IN GE/SI(001)
[J].
PHYSICAL REVIEW B,
1991, 43 (06)
:5001-5011
[43]
ELIMINATION OF TWINNING IN MOLECULAR-BEAM EPITAXY OF GAAS/SI AND GAAS/INSULATOR
[J].
JOURNAL DE PHYSIQUE,
1988, 49 (C-4)
:697-700
[44]
Initial growth stages of Si–Ge–Sn ternary alloys grown on Si (100) by low-temperature molecular-beam epitaxy
[J].
Semiconductors,
2015, 49
:1582-1586
[45]
Electron diffraction on GaAs nanowhiskers grown on Si(100) and Si(111) substrates by molecular-beam epitaxy
[J].
Physics of the Solid State,
2007, 49
:1440-1445
[48]
MOLECULAR-BEAM EPITAXY GROWTH MECHANISMS ON GAAS(100) SURFACES
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1987, 5 (05)
:1482-1489
[49]
MOLECULAR-BEAM EPITAXY AND RECONSTRUCTED SURFACES - INITIAL-STAGES OF INTERFACE FORMATION IN GROUP IV-IV STRUCTURES
[J].
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING,
1985, 38 (03)
:171-179