ZIRCONIUM NITRIDE FILMS PREPARED BY CATHODIC ARC PLASMA DEPOSITION PROCESS

被引：82

作者：

JOHNSON, PC

RANDHAWA, H

机构：

[1] Vac-Tec Systems Inc, Boulder, CO,, USA, Vac-Tec Systems Inc, Boulder, CO, USA

来源：

SURFACE & COATINGS TECHNOLOGY | 1987年 / 33卷 / 1-4期

关键词：

COATINGS - Wear Resisting - CUTTING TOOLS - Coatings - NITRIDES - Chemical Vapor Deposition;

D O I：

10.1016/0257-8972(87)90176-9

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Zirconium nitride has been reactively deposited using the cathodic arc plasma deposition process. Deposited films have been analyzed for their surface morphology, crystal structure, microhardness and composition. Performance of the films was evaluated by conventional wear testing methods and the potential for decorative applications by reflectivity measurements. Wear test results indicated that ZrN is marginally superior to titanium nitride in conventional metal cutting applications, but outperforms TiN by a factor of two when cutting titanium alloys. Reflectance measurements indicate that ZrN-doped films are very similar to gold films.

引用

页码：53 / 62

页数：10

共 10 条

[1]

BUNSHAH RF, 1986, TRIB ECUT REPORT, P2

[2]

CHRISTENSEN CAJ, 1976, J CRYST GROWTH, V33, P99

[3] TEMPERATURE RELATED EVOLUTION OF THE REFLECTANCE, THE COMPLEX INDEX AND THE SPECTRAL SELECTIVITY OF ZIRCONIUM NITRIDE [J].

FRANCOIS, JC ;

CHASSAING, G ;

GRAVIER, P ;

PIERRISNARD, R ;

SIGRIST, M .

OPTICS COMMUNICATIONS, 1986, 57 (01) :59-63

[4]

NOZAWA T, 1986, IEGE T COMPONENTS HY, V8

[5]

RANDHAWA HS, 1987, RES DEV FEB, P184

[6]

RANDHAWA HS, 1986, J VAC SCI TECHNO NOV, P2755

[7]

SASANOMA M, 1983, Patent No. 4415421

[8]

SMITH DPE, 1986, IBM TECHNICAL DISCLO, V27, P48

[9] VERY HIGH-RATE REACTIVE SPUTTERING OF TIN, ZRN AND HFN [J].

SPROUL, WD .

THIN SOLID FILMS, 1983, 107 (02) :141-147

[10]

SPROUL WD, COMMUNICATIONS

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