RECRYSTALLIZATION KINETICS PATTERN IN III-V IMPLANTED SEMICONDUCTORS

被引：14
|
作者：
LICOPPE, C
NISSIM, YI
MERIADEC, C
HENOC, P
机构：
来源：
APPLIED PHYSICS LETTERS | 1987年 / 50卷 / 23期
关键词：
D O I：
10.1063/1.97756
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
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页码：1648 / 1650
页数：3
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