CHEMICAL-VAPOR-DEPOSITION OF CA(TI,FE)O-3 THIN-FILM BY THERMAL-DECOMPOSITION OF ORGANOCOMPLEXES

被引：3
作者：
ITOH, H [1 ]
OIKAWA, I [1 ]
IWAHARA, H [1 ]
AIZAWA, M [1 ]
机构：
[1] TOTO LTD,DIV RES & DEV,CHIGASAKI,KANAGAWA 253,JAPAN
来源：
JOURNAL OF MATERIALS SCIENCE | 1995年 / 30卷 / 08期
关键词：
D O I：
10.1007/BF00353046
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
A thin film of Ca(Ti, Fe)O-3, which is a mixed conductor of oxide ions and electrons, was prepared on various substrates by chemical vapour deposition using organocomplexes Ca(C11H19O2)(2), Ti(O-(C3H7)-C-i)(4) and Fe(C5H7O2)(3) as starting materials. These complexes were evaporated at temperatures of 250, 115 and 45 degrees C, respectively, and transported to the substrate surface at an almost steady state. Homogeneous films of single-phase Ca(Ti, Fe)O-3 were obtained at deposition temperatures of 750-800 degrees C under the total pressure of 30 torr for the reaction time of 60-90 min on silica glass substrate. The amount of Ca(Ti, Fe)(3) films formed and their microstructure were found to be greatly affected by the compositions and surface structures of substrate materials.
引用
收藏
页码：2139 / 2144
页数：6
相关论文
共 11 条
  • [1] EPITAXIAL PBTIO3 THIN-FILMS GROWN BY ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION
    DEKEIJSER, M
    DORMANS, GJM
    CILLESSEN, JFM
    DELEEUW, DM
    ZANDBERGEN, HW
    [J]. APPLIED PHYSICS LETTERS, 1991, 58 (23) : 2636 - 2638
  • [2] ELECTRICAL-CONDUCTION IN CATI1-XFEXO3-DELTA UNDER LOW OXYGEN-PRESSURE AND ITS APPLICATION FOR HYDROGEN-PRODUCTION
    ESAKA, T
    FUJII, T
    SUWA, K
    [J]. SOLID STATE IONICS, 1990, 40-1 : 544 - 547
  • [3] FUNAKUBO H, 1991, NIPPON SERAM KYO GAK, V99, P1169, DOI 10.2109/jcersj.99.1169
  • [4] FUNAKUBO H, 1991, NIPPON SERAM KYO GAK, V99, P248, DOI 10.2109/jcersj.99.248
  • [5] REDUCED PRESSURE MOCVD OF C-AXIS ORIENTED BISRCACUO THIN-FILMS
    HAMAGUCHI, N
    VIGIL, J
    GARDINER, R
    KIRLIN, PS
    [J]. JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1990, 29 (04): : L596 - L599
  • [6] MIXED CONDUCTION AND OXYGEN PERMEATION IN THE SUBSTITUTED OXIDES FOR CATIO3
    IWAHARA, H
    ESAKA, T
    MANGAHARA, T
    [J]. JOURNAL OF APPLIED ELECTROCHEMISTRY, 1988, 18 (02) : 173 - 177
  • [7] IWAHARA H, 1989, PETROTECH, V12, P224
  • [8] Preparation of BaTiO3 films by CVD
    Nakazawa, Hidenobu
    Yamane, Hisanori
    Hirai, Toshio
    [J]. Nippon Seramikkusu Kyokai Gakujutsu Ronbunshi/Journal of the Ceramic Society of Japan, 1991, 99 (1150): : 527 - 529
  • [9] PREPARATION AND ELECTRICAL-PROPERTIES OF MOCVD-DEPOSITED PZT THIN-FILMS
    SAKASHITA, Y
    ONO, T
    SEGAWA, H
    TOMINAGA, K
    OKADA, M
    [J]. JOURNAL OF APPLIED PHYSICS, 1991, 69 (12) : 8352 - 8357
  • [10] SUPERCONDUCTING THIN-FILMS OF Y-BA-CU-O PREPARED BY METALORGANIC CHEMICAL VAPOR-DEPOSITION
    SINGH, R
    SINHA, S
    HSU, NJ
    CHOU, P
    SINGH, RK
    NARAYAN, J
    [J]. JOURNAL OF APPLIED PHYSICS, 1990, 67 (03) : 1562 - 1565
12