MICRON-SIZE OPTICAL WAVE-GUIDE FOR OPTOELECTRONIC INTEGRATED-CIRCUIT

Fundamental technologies for the optical interconnection in the VLSI chip have been developed by using conventional Si LSI technologies. The micron-size optical waveguide consisting of Si3N4 core and SiO2 cladding layers has been fabricated by low-pressure chemical vapor deposition (LPCVD) and atmospheric-pressure chemical vapor deposition (APCVD), respectively. The small lenses and the micron-size mirror which changes the light propagation direction from vertical to horizontal for the interlayer interconnection have also been fabricated.