A UNIFIED TREATMENT OF THICKNESS HOMOGENEITY PROBLEMS IN CVD(II) - COLD-WALL REACTORS

被引：1
作者：
ARNOLD, H
机构：
来源：
KRISTALL UND TECHNIK-CRYSTAL RESEARCH AND TECHNOLOGY | 1980年 / 15卷 / 05期
关键词：
D O I：
10.1002/crat.19800150510
中图分类号：
O7 [晶体学];
学科分类号：
0702 ; 070205 ; 0703 ; 080501 ;
摘要：
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页码：543 / 548
页数：6
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