DUO PLASMATRON ION SOURCE FOR USE IN ACCELERATORS

被引:92
作者
MOAK, CD
BANTA, HE
THURSTON, JN
JOHNSON, JW
KING, RF
机构
关键词
D O I
10.1063/1.1716726
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
引用
收藏
页码:694 / 699
页数:6
相关论文
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