PLASMA CHEMICAL ASPECTS OF MAGNETRON ION ETCHING WITH CF4/O-2

被引：25

作者：

BRIGHT, AA

KAUSHIK, S

OEHRLEIN, GS

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1987年 / 62卷 / 06期

关键词：

D O I：

10.1063/1.339463

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2518 / 2522

页数：5

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