DEFECT FORMATION IN H-IMPLANTATION OF CRYSTALLINE SI

被引：112

作者：

KEINONEN, J ^{[1
]}

HAUTALA, M ^{[1
]}

RAUHALA, E ^{[1
]}

KARTTUNEN, V ^{[1
]}

KURONEN, A ^{[1
]}

RAISANEN, J ^{[1
]}

LAHTINEN, J ^{[1
]}

VEHANEN, A ^{[1
]}

PUNKKA, E ^{[1
]}

HAUTOJARVI, P ^{[1
]}

机构：

[1] HELSINKI UNIV TECHNOL,PHYS LAB,SF-02150 ESPOO 15,FINLAND

来源：

PHYSICAL REVIEW B | 1988年 / 37卷 / 14期

关键词：

D O I：

10.1103/PhysRevB.37.8269

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：8269 / 8277

页数：9

共 45 条

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