CHEMISTRY INITIATED BY ATOMIC SILICON IONS IN THE GAS-PHASE - FORMATION OF SILICON-BEARING IONS AND MOLECULES

被引：45

作者：

BOHME, DK ^{[1
]}

机构：

[1] YORK UNIV,CTR RES EARTH & SPACE SCI,N YORK M3J 1P3,ONTARIO,CANADA

来源：

INTERNATIONAL JOURNAL OF MASS SPECTROMETRY AND ION PROCESSES | 1990年 / 100卷

关键词：

D O I：

10.1016/0168-1176(90)85105-B

中图分类号：

O64 [物理化学（理论化学）、化学物理学]; O56 [分子物理学、原子物理学];

学科分类号：

070203 ; 070304 ; 081704 ; 1406 ;

摘要：

Results of recent gas-phase laboratory studies at York University are reviewed which provide insight into the formation of silicon-bearing ions and molecules initiated by reactions of ground state atomic silicon ions and into the influence of aromatic "surfaces" on this chemistry. Emphasis is given to reactions which lead to the chemical bonding of silicon with hydrogen, carbon, nitrogen, oxygen and sulphur. © 1990.

引用

页码：719 / 736

页数：18

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