PARAMETERS AFFECTING SENSITIVITY OF POLY(METHYL METHACRYLATE) AS A POSITIVE LITHOGRAPHIC RESIST

被引：22

作者：

GIPSTEIN, E ^{[1
]}

OUANO, AC ^{[1
]}

JOHNSON, DE ^{[1
]}

NEED, OU ^{[1
]}

机构：

[1] IBM CORP,RES LAB,SAN JOSE,CA 95193

来源：

POLYMER ENGINEERING AND SCIENCE | 1977年 / 17卷 / 06期

关键词：

D O I：

10.1002/pen.760170613

中图分类号：

TQ [化学工业];

学科分类号：

0817 ;

摘要：

引用

页码：396 / 401

页数：6

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