TAILORING OF INTERNAL FIELDS IN INGAAS/GAAS MULTIWELL STRUCTURES GROWN ON (111)B GAAS

被引:74
作者
PABLA, AS
SANCHEZROJAS, JL
WOODHEAD, J
GREY, R
DAVID, JPR
REES, GJ
HILL, G
PATE, MA
ROBSON, PN
HOGG, RA
FISHER, TA
WILLCOX, ARK
WHITTAKER, DM
SKOLNICK, MS
MOWBRAY, DJ
机构
[1] UNIV SHEFFIELD,DEPT PHYS,SHEFFIELD S3 7RH,S YORKSHIRE,ENGLAND
[2] UNIV POLITECN MADRID,DEPT INGN ELECTR,MADRID,SPAIN
关键词
D O I
10.1063/1.109925
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a study of internal field distributions in strained InGaAs/GaAs multiple quantum wells in p-i-n structures grown on (111) B-oriented GaAs. Room temperature photocurrent spectroscopy shows clear blueshifting of the el-hh1 transition as the well fields are reduced by external bias. The relative length of total well to total barrier material is shown to be an important factor in determining the well and barrier fields. We demonstrate a photocurrent contrast ratio of 4.5:1 for only 3 V applied bias across a 25 quantum well In0.13Ga0.87As p-i-n diode and discuss the implication of our results to the design of high performance electro-optic modulators and self electro-optic effect devices in this material system.
引用
收藏
页码:752 / 754
页数:3
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