MECHANICAL STRESSES IN VAPOR DEPOSITED SIO2 FILMS

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作者：
ABOAF, JA
机构：
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1968年 / 115卷 / 11期
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中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
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页码：C325 / &
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