DEPOSITION OF HIGH-TC SUPERCONDUCTING Y-BA-CU-O THIN-FILMS AT LOW-TEMPERATURES USING A PLASMA-ENHANCED ORGANOMETALLIC CHEMICAL VAPOR-DEPOSITION APPROACH

A plasma-enhanced organometallic chemical vapor deposition process is reported for the preparation of YBa2Cu3O7-x thin films using two differing rf plasma coupling configurations. For films grown under a direct plasma glow, the YBa2Cu3O7-x phase is not produced in the asdeposited state. However, when plasma-activated nitrous oxide is used as the reactant gas in a downstream reactor configuration, superconducting YBa2Cu3O7-x films are formed in situ at a substrate temperature of 610°C. Such films have a low carbon content and a mirror-like surface which is free of voids. These preliminary results indicate that the low temperature fabrication of high-Tc superconducting oxide films by plasma-enhanced organometallic chemical vapor deposition is feasible. © 1990.