TRENDS IN ADVANCED PROCESS TECHNOLOGY - SUBMICROMETER CMOS DEVICE DESIGN AND PROCESS REQUIREMENTS

被引：19
作者：
BROWN, DM
GHEZZO, M
PIMBLEY, JM
机构：
[1] GE, Schenectady, NY, USA, GE, Schenectady, NY, USA
来源：
PROCEEDINGS OF THE IEEE | 1986年 / 74卷 / 12期
关键词：
D O I：
10.1109/PROC.1986.13685
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
137
引用
收藏
页码：1678 / 1702
页数：25
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