THERMAL-DEGRADATION OF TISI2/POLY-SI GATE ELECTRODES

被引：18

作者：

NYGREN, S

OSTLING, M

PETERSSON, CS

NORSTROM, H

RYDEN, KH

BUCHTA, R

CHATFIELD, C

机构：

[1] SWEDISH INST MICROELECTR,S-16421 KISTA,SWEDEN

[2] SANDVIK COROMANT,S-12612 STOCKHOLM,SWEDEN

来源：

THIN SOLID FILMS | 1989年 / 168卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90016-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：325 / 334

页数：10

共 13 条

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