NONCONTACTING MICROSTRIP MONITOR FOR LIQUID-FILM THICKNESS

被引：4

作者：

HURLEY, RB

KAUFMAN, I

ROY, RP

机构：

[1] ARIZONA STATE UNIV,DEPT ELECT & COMP ENGN,TEMPE,AZ 85287

[2] ARIZONA STATE UNIV,DEPT MECH & AEROSP ENGN,TEMPE,AZ 85287

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1990年 / 61卷 / 09期

关键词：

D O I：

10.1063/1.1141340

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A UHF/microwave technique that measures the wave propagation velocity along a modified microstrip line to determine the thickness of an adjacent film of water (up to about 1 mm) on a metallic surface is described. The technique may be extendable to the measurement of the thickness of coatings on both metallic and nonmetallic surfaces.

引用

页码：2462 / 2465

页数：4

共 9 条

[1]

GHANDHI OP, 1981, MICROWAVE ENG APPLIC, P190

[2]

GUPTA KC, 1979, MICROSTRIP LINES SLO, P7

[3]

HOFFMAN RK, 1987, HDB MICROWAVE INTEGR, P208

[4]

KENT M, 1979, J MICROWAVE POWER EE, V14, P363

[5]

Kent M., 1973, Journal of Microwave Power, V8, P189

[6] ANALYSIS AND OPTIMAL-DESIGN OF MICROSTRIP SENSORS [J].

KHALID, KB ;

MACLEAN, TSM ;

RAZAZ, M ;

WEBB, PW .

IEE PROCEEDINGS-H MICROWAVES ANTENNAS AND PROPAGATION, 1988, 135 (03) :187-195

[7]

KLEIN A, 1980, 10TH P EUR MICR C WA, P526

[8]

KRUSZEWSKI A, 1973, J MICROWAVE POWER, V8, P323

[9] MICROWAVE METHOD FOR MEASUREMENT OF LIQUID-FILM THICKNESS IN GAS-LIQUID FLOW [J].

ROY, RP ;

KU, J ;

KAUFMAN, I ;

SHUKLA, J .

REVIEW OF SCIENTIFIC INSTRUMENTS, 1986, 57 (05) :952-956

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