RANGE PARAMETERS STUDY OF MEDIUM-HEAVY IONS IMPLANTED INTO LIGHT SUBSTRATES

被引：59

作者：

GRANDE, PL ^{[1
]}

ZAWISLAK, FC ^{[1
]}

FINK, D ^{[1
]}

BEHAR, M ^{[1
]}

机构：

[1] HAHN MEITNER INST KERNFORSCH BERLIN GMBH,W-1000 BERLIN 39,GERMANY

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 1991年 / 61卷 / 03期

关键词：

D O I：

10.1016/0168-583X(91)95631-M

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

Carbon films were implanted with Cs, Xe, Sn, Rb, Kr, Ga and Cu and boron films with Bi, Pb, Au, Yb, Cs and Rb ions in an energy range of 10 to 300 keV. Range parameters were determined using the Rutherford backscattering technique. The experimental results are 20-40% higher than the theoretical predictions by Ziegler, Biersack and Littmark. Good agreement is achieved only when inelastic effects are included in the nuclear stopping regime. These features are also observed when previously published range parameter data for medium-heavy ions implanted into Be films are analyzed.

引用

页码：282 / 290

页数：9

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