POLYALKYLSILYNE PHOTODEFINED THIN-FILM OPTICAL WAVE-GUIDES

被引：50

作者：

HORNAK, LA ^{[1
]}

WEIDMAN, TW ^{[1
]}

KWOCK, EW ^{[1
]}

机构：

[1] AT&T BELL LABS,MURRAY HILL,NJ 07974

来源：

JOURNAL OF APPLIED PHYSICS | 1990年 / 67卷 / 05期

关键词：

D O I：

10.1063/1.345537

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Polysilynes, a new class of amorphous alkyl silicon network polymers, undergo a novel photo-oxidative crosslinking reaction associated with up to a 15% decrease in refractive index related to the loss of SiSi bonding. We describe the fabrication and initial measurements of waveguides formed with this index imaging technique in poly(cyclohexylsilyne) films on both SiO2 and poly(methyl methacrylate)-coated silicon wafers. Measurements of multimode guides show typical propagation losses of 0.68 dB/cm at 633 nm. Results indicate the polyalkylsilynes show promise as self-developing, planar optical waveguide media.

引用

页码：2235 / 2239

页数：5

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