SURFACE PHOTODEPOSITION OF METAL-OXIDES BY DECOMPOSITION OF SEVERAL GROUP IVA ORGANOMETALLICS (BENZYLTRIMETHYLSILANES AND BENZYLTRIMETHYLSTANNANES) ON TIO2

被引：16

作者：

DULAY, MT ^{[1
]}

WASHINGTONDEDEAUX, D ^{[1
]}

FOX, MA ^{[1
]}

机构：

[1] UNIV TEXAS,DEPT CHEM,AUSTIN,TX 78712

来源：

JOURNAL OF PHOTOCHEMISTRY AND PHOTOBIOLOGY A-CHEMISTRY | 1991年 / 61卷 / 01期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/1010-6030(91)85083-S

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The photocatalytic decomposition of several substituted benzyltrimethylsilanes and benzyltrimethylstannanes on band gap irradiated TiO2 powders suspended in acetonitrile causes the deposition of SiR(x) and SiO2 and of SnR(x) and SnO2 respectively, on the photoactive surface. A mechanism consistent with interfacial trapping of a photogenerated electron-hole pair can successfully rationalize the observed kinetics and substituent effects.

引用

页码：153 / 163

页数：11

共 42 条

[1] SURFACE PHOTOCHEMISTRY - ON THE MECHANISM OF THE SEMICONDUCTOR PHOTOINDUCED VALENCE ISOMERIZATION OF HEXAMETHYL-DEWAR BENZENE TO HEXAMETHYLBENZENE [J].