SMALL DIMENSION BRAGG REFLECTORS FORMED BY AIR-ISOLATED GAAS-LAYERS

被引：1

作者：

BEYLER, CA

HUMMEL, SG

FRATESCHI, N

DAPKUS, PD

机构：

[1] Center for Photonic Technology, University of Southern California, Los Angeles

来源：

ELECTRONICS LETTERS | 1991年 / 27卷 / 07期

关键词：

LASERS AND LASER APPLICATIONS; SEMICONDUCTOR LASERS; DIFFRACTION;

D O I：

10.1049/el:19910371

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We demonstrate a process for the fabrication of air-isolated microstructures based upon impurity diffusion disordering and selective etching of multilayer structures. The process is illustrated by the fabrication of 5 and 22-mu-m wide Bragg reflectors with reflectivities in excess of 95%.

引用

页码：588 / 590

页数：3

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