NEW TECHNIQUE FOR INVESTIGATING ELECTROCHEMICAL BEHAVIOR OF ELECTROLESS NICKEL PLATING

被引：47

作者：

FELDSTEIN, N

机构：

来源：

关键词：

D O I：

10.1149/1.2408208

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：869 / +

页数：1

共 20 条

[1] NICKEL PLATING ON STEEL BY CHEMICAL REDUCTION
BRENNER, A
RIDDELL, GE
[J]. JOURNAL OF RESEARCH OF THE NATIONAL BUREAU OF STANDARDS, 1946, 37 (01): : 31 - 34
[2] DELAHAY P, 1959, NEW INSTRUMENTAL MET
[3] ANIONIC INHIBITION IN ELECTROLESS PLATING
FELDSTEIN, N
AMODIO, PR
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1970, 117 (09) : 1110 - +
[4] FELDSTEIN N, UNPUBLISHED RESULTS
[5] FELDSTEIN N, 1971, J ANAL CHEM, V43
[6] STRUCTURE OF CHEMICALLY DEPOSITED NICKEL
GOLDENSTEIN, AW
ROSTOKER, W
SCHOSSBERGER, F
GUTZEIT, G
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1957, 104 (02) : 104 - 110
[7] GORBUNOVA KM, 1963, OTS6311003 NAT SCIEN
[8] STRUCTURE OF ELECTROLESS NICKEL
GRAHAM, AH
LINDSAY, RW
READ, HJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1962, 109 (12) : 1200 - 1201
[9] STRUCTURE AND MECHANICAL PROPERTIES OF ELECTROLESS NICKEL
GRAHAM, AH
LINDSAY, RW
READ, HJ
[J]. JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1965, 112 (04) : 401 - &
[10] HOLBROOK KA, 1969, PLATING, V56, P523