RELIABLE SINGLE-TARGET SPUTTERING PROCESS FOR HIGH-TEMPERATURE SUPERCONDUCTING FILMS AND DEVICES

被引：112
作者：
SANDSTROM, RL
GALLAGHER, WJ
DINGER, TR
KOCH, RH
LAIBOWITZ, RB
KLEINSASSER, AW
GAMBINO, RJ
BUMBLE, B
CHISHOLM, MF
机构：
来源：
APPLIED PHYSICS LETTERS | 1988年 / 53卷 / 05期
关键词：
D O I：
10.1063/1.100615
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：444 / 446
页数：3
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