3 TO 15 KEV AR+ INDUCED AUGER-ELECTRON EMISSION FROM SI AND AR

被引：27

作者：

KEMPF, J ^{[1
]}

KAUS, G ^{[1
]}

机构：

[1] IBM GERMANY,D-7000 STUTTGART 80,FED REP GER

来源：

APPLIED PHYSICS | 1977年 / 13卷 / 03期

关键词：

D O I：

10.1007/BF00882890

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：261 / 266

页数：6

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