SELF-SUSTAINED SELF-SPUTTERING - A POSSIBLE MECHANISM FOR THE SUPERDENSE GLOW PHASE OF A PSEUDOSPARK

被引:51
作者
ANDERS, A
ANDERS, S
GUNDERSEN, MA
MARTSINOVSKII, AM
机构
[1] UNIV SO CALIF,DEPT PHYS,LOS ANGELES,CA 90089
[2] ACAD SCI ST PETERSBURG,AF IOFFE PHYSICOTECH INST,ST PETERSBURG 194021,RUSSIA
关键词
D O I
10.1109/27.402313
中图分类号
O35 [流体力学]; O53 [等离子体物理学];
学科分类号
070204 ; 080103 ; 080704 ;
摘要
Self-sustained self-sputtering occurring during high current pseudospark operation (approximate to 10(4) A/cm(2), I>10(3) A) is shown to be a possible mechanism for the superdense glow. The mean-free-path for ionization of cathode material sputtered in the low-current hollow-cathode phase can be shorter than the cathode-anode gap distance, and ionized atoms can return to the cathode surface, self-sputtering with a yield greater than one. The self-sputtered cathode atoms become ionized in the beam of electrons accelerated in the cathode sheath. A large fraction of the discharge current at the cathode surface can be carried uniformly over the surface by ions, and a very high electron emission density is not required to maintain the high current.
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收藏
页码:275 / 282
页数:8
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