INFRARED STUDIES OF AMORPHOUS-CARBON FILMS FORMED BY PLASMA DECOMPOSITION OF ACETYLENE

被引：3
|
作者：
SUNIL, D
VANKAR, VD
CHOPRA, KL
机构：
[1] Department of Physics, Indian Institute of Technology, New Delhi
来源：
JOURNAL OF MATERIALS ENGINEERING | 1990年 / 12卷 / 02期
关键词：
D O I：
10.1007/BF02834065
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
Thin films of amorphous hydrogenated carbon have been deposited by radio frequency (RF) glow discharge decomposition of various mixtures of acetylene and hydrogen gases. The films were grown on silicon substrates kept on both the powered and grounded electrodes. These films were annealed in vacuum in a temperature range of 300-600° C. Infrared spectroscopy has been used to find the hydrogen content and also the structural changes associated with the annealing process. It has been shown that the hydrogen content in the film is very sensitive to the process parameters. The annealing process results in a near hydrogen-free film. The microstructure of the films is related to the process parameters and the annealing temperature. © 1990 Springer-Verlag New York Inc.
引用
收藏
页码：121 / 126
页数：6
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