A XE MARKER STUDY OF THE TRANSFORMATION OF NI2SI TO NISI IN THIN-FILMS

被引：52
作者：
FINSTAD, TG
机构：
来源：
PHYSICA STATUS SOLIDI A-APPLIED RESEARCH | 1981年 / 63卷 / 01期
关键词：
D O I：
10.1002/pssa.2210630130
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
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页码：223 / 228
页数：6
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