MICROSTRUCTURE OF BI2(SR,CA)3CU2OX/BI2SR2CUOX/BI2(SR,CA)3CU2OX MULTILAYER FILMS FABRICATED BY ION-BEAM SPUTTERING
被引:8
作者:
SATOH, T
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h-index: 0
机构:
NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPANNEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN
SATOH, T
[1
]
FUJITA, J
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h-index: 0
机构:
NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPANNEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN
FUJITA, J
[1
]
YOSHITAKE, T
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h-index: 0
机构:
NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPANNEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN
YOSHITAKE, T
[1
]
IGARASHI, H
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h-index: 0
机构:
NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPANNEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN
IGARASHI, H
[1
]
MIURA, S
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h-index: 0
机构:
NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPANNEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN
MIURA, S
[1
]
MATSUKURA, N
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机构:
NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPANNEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN
MATSUKURA, N
[1
]
TSUGE, H
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h-index: 0
机构:
NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPANNEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN
TSUGE, H
[1
]
机构:
[1] NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA 305,JAPAN
来源:
PHYSICA C
|
1991年
/
185卷
/
pt 3期
关键词:
3;
D O I:
10.1016/0921-4534(91)91154-V
中图分类号:
O59 [应用物理学];
学科分类号:
摘要:
Multilayers of Bi2(Sr,Ca)3Cu2Ox/Bi2Sr2CuOx/Bi2(Sr,Ca)3Cu2Ox(2212/2201/2212) were fabricated by ion beam sputtering on polished (001)MgO substrates with a thin 2201 buffer layer. The buffer layers significantly improved the surface flatness of the multilayers. The multilayers grew epitaxially with a c-axis orientation normal to the substrate surface. The intermediate 2201 layers were uniform in thickness and the 2212/2201 interfaces were abrupt. The results indicate that the 2212/2201/2212 multilayers are suitable for the fabrication of high temperature superconducting Josephson junctions.