EFFECT OF ARGON SPUTTERING PRESSURE ON THE MAGNETIC-PROPERTIES AND MORPHOLOGY OF TBFECO FILMS

被引:18
作者
HATWAR, TK
PALUMBO, AC
STINSON, DG
机构
[1] Eastman Kodak Co, Rochester, NY, USA
关键词
D O I
10.1109/20.92242
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
14
引用
收藏
页码:2775 / 2777
页数:3
相关论文
共 14 条
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SHIEH HPD, 1985, IEEE T MAGN, V22, P1632
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SHIMOKAWATO S, 1987, INT S MAGNETOOPTIC S
[14]  
Vossen JL, 1978, THIN FILM PROCESSES, P15